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THE PREPARATION AND PROPERTIES OF A POLYSILOXANE ELECTRON RESISTROBERTS ED.1973; J. ELECTROCHEM. SOC.; U.S.A.; DA. 1973; VOL. 120; NO 12; PP. 1716-1721; BIBL. 15 REF.Article

POLY (BUTENE-1 SULFONE) AS A POSITIVE ELECTRON RESISTBOWDEN MJ; THOMPSON LF.1974; APPL. POLYM. SYMP.; U.S.A.; DA. 1974; NO 23; PP. 99-106; BIBL. 11 REF.; (2ND SYMP. SCANNING ELECTRON MICROSC. POLYM. COATINGS. 165TH NATL. MEET. AM. CHEM. SOC.; DALLAS; 1973)Conference Paper

PROPERTIES OF SOME ELECTRON SENSITIVE SILOXANE RESISTSGAZARD M; DUBOIS JC; DUCHESNE C et al.1974; APPL. POLYM. SYMP.; U.S.A.; DA. 1974; NO 23; PP. 107-116; BIBL. 8 REF.; (2ND SYMP. SCANNING ELECTRON MICROSC. POLYM. COATINGS. 165TH NATL. MEET. AM. CHEM. SOC.; DALLAS; 1973)Conference Paper

POLY(BUTENE-1 SULFONE) - A HIGHLY SENSITIVE POSITIVE RESIST.BOWDEN MJ; THOMPSON LF; BALLANTYNE JP et al.1975; J. VACUUM SCI. TECHNOL.; U.S.A.; DA. 1975; VOL. 12; NO 6; PP. 1294-1296; BIBL. 9 REF.; (SYMP. ELECTRON ION PHOTON BEAM TECHNOL. 13. PROC.; COLORADO SPRINGS; 1975)Conference Paper

EPOXIDIZED CIS-1,4-POLYBUTADIENE, A HIGHLY SENSITIVE ELECTRON BEAM RESISTNONOGAKI S; MORISHITA H; SAITOU N et al.1974; APPL. POLYM. SYMP.; U.S.A.; DA. 1974; NO 23; PP. 117-123; BIBL. 6 REF.; (2ND SYMP. SCANNING ELECTRON MICROSC. POLYM. COATINGS. 165TH NATL. MEET. AM. CHEM. SOC.; DALLAS; 1973)Conference Paper

A NEW FAMILY OF POSITIVE ELECTRON BEAM RESISTS. POLY(OLEFIN SULFONES)THOMPSON LF; BOWDEN MJ.1973; J. ELECTROCHEM. SOC.; U.S.A.; DA. 1973; VOL. 120; NO 12; PP. 1722-1726; BIBL. 8 REF.Article

ELECTRON SENSITIVE POLYMERS AS HIGH RESOLUTION RESISTSHATZAKIS M.1974; APPL. POLYM. SYMP.; U.S.A.; DA. 1974; NO 23; PP. 73-86; BIBL. 19 REF.; (2ND SYMP. SCANNING ELECTRON MICROSC. POLYM. COATINGS. 165TH NATL. MEET. AM. CHEM. SOC.; DALLAS; 1973)Conference Paper

NEW HIGH SENSITIVE ELECTRON RESIST MATERIALSPAAL G; STRAHLE UD; KIELHORN G et al.1973; J. ELECTROCHEM. SOC.; U.S.A.; DA. 1973; VOL. 120; NO 12; PP. 1714-1716; BIBL. 6 REF.Article

MOLECULAR PARAMETERS AND LITHOGRAPHIC PERFORMANCE OF POLY (GLYCIDYL METHACRYLATE-CO-ETHYL ACRYLATE): A NEGATIVE ELECTRON RESISTTHOMPSON LF; BALLANTYNE JP; FEIT ED et al.1975; J. VACUUM SCI. TECHNOL.; U.S.A.; DA. 1975; VOL. 12; NO 6; PP. 1280-1283; BIBL. 10 REF.; (SYMP. ELECTRON ION PHOTON BEAM TECHNOL. 13. PROC.; COLORADO SPRINGS; 1975)Conference Paper

A MODIFIED METHACRYLATE POSITIVE ELECTRON RESISTROBERTS ED.1974; APPL. POLYM. SYMP.; U.S.A.; DA. 1974; NO 23; PP. 87-98; BIBL. 8 REF.; (2ND SYMP. SCANNING ELECTRON MICROSC. POLYM. COATINGS. 165TH NATL. MEET. AM. CHEM. SOC.; DALLAS; 1973)Conference Paper

ELECTRORESIST ULTRAMINCE EN COUCHES MONOMOLECULAIRES.BARRAUD A; ROSILIO C.1976; VIDE; FR.; DA. 1976; NO 183 SUPPL.; PP. 215-217; ABS. ANGL.; BIBL. 8 REF.; (MATER. TECHNOL. MICROELECTR. TENDANCES ACTUELLES. COLLOQ. C.R.; MONTPELLIER; 1976)Conference Paper

ELECTRON SENSITIVE RESISTS DERIVED FROM VINYLETHER-MALEIC ANHYDRIDE COPOLYMERSCOLE HS; SKELLY DW; WAGNER BC et al.1975; I.E.E.E. TRANS. ELECTRON DEVICES; U.S.A.; DA. 1975; VOL. 22; NO 7; PP. 417-420; BIBL. 13 REF.Article

BREVET 2.352.007 (A1) (76 15520). - 21 MAI 1976. RESINE SENSIBLE AUX ELECTRONS ET PROCEDE DE FABRICATION DE LADITE RESINE.sdPatent

CONTRIBUTION A L'ETUDE DES PROPRIETES D'UNE RESINE NEGATIVE DE MASQUAGE ELECTRONIQUE: LE POLYMETHACRYLATE DE GLYCIDYLEVIGOT CLAUDE.1979; ; FRA; DA. 1979; 2593; 110 P.: ILL.; 30 CM; BIBL. 53 REF.; TH. 3EME CYCLE: CHIM. PHYS./PARIS 11/1979Thesis

ELECTRON-SENSITIVE FILM-FORMING MATERIALS AND THEIR USES IN SEMICONDUCTOR TECHNOLOGY.ROBERTS ED.1976; VACCUUM; G.B.; DA. 1976; VOL. 26; NO 10-11; PP. 459-467; BIBL. 37 REF.; (CONF. INTERACTION ELECTR. SOLIDS. PROC.; SOUTHAMPTON; 1976)Conference Paper

POLYMERIC RESISTS FOR X-RAY LITHOGRAPHY.THOMPSON LF; FEIT ED; BOWDEN MJ et al.1974; J. ELECTROCHEM. SOC.; U.S.A.; DA. 1974; VOL. 121; NO 11; PP. 1500-1503; BIBL. 16 REF.Article

ETUDE DE POLYMERES ORGANIQUES ET ORGANO-METALLIQUES POUR REALISATION DE GUIDES DE LUMIERE PAR MASQUAGE ELECTRONIQUE.DUBOIS JC.1974; DGRST-7371731; FR.; DA. 1974; PP. 1-15; H.T. 9; BIBL. 2 REF.; (RAPP. FINAL, ACTION CONCERTEE: COMPOSANTS CIRCUITS MICROMINIATURISES)Report

ENDUITS SENSIBLES AUX X ET AUX ELECTRONS DANS LA MICROELECTRONIQUE ACTUELLESELIVANOV GK; MOZZHUKHIN DD; GRIBOV BG et al.1980; MIKROELEKTRONIKA; ISSN 0544-1269; SUN; DA. 1980; VOL. 9; NO 6; PP. 517-539; BIBL. 76 REF.Article

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